Programmable mask and method for fabricating biomolecule array using the same

ABSTRACT

A programmable mask used in a photolithography process for fabricating a biomolecule array and a method for fabricating a biomolecule array using the same are disclosed. Particularly, a TFT-LCD type programmable mask for selectively transmitting incident light in accordance with an electrical signal applied thereto and a method for fabricating a biomolecule array using the same are provided. The ultraviolet light is selectively illuminated to a sample substrate so that the biomolecule array having high density can be fabricated.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a programmable mask adapted forfabricating a biomolecule array and a method for fabricating abiomolecule array using the same, more particularly, to a programmablemask adapted for fabricating the biomolecule array such as DNA byilluminating ultraviolet light to a specific cell and a method forfabricating a biomolecule array using the same.

2. Description of the Prior Art

First, in a biomolecule or a macromolecule array formed on a substrate,the area composed of a kind of the biomolecule or the macromolecule isreferred as a cell.

The research for the operation for performing the plurality ofexperiment at once by using the biomolecule or macromolecule array hasbeen progressed. As the biomolecule or macromolecule array, there are,for example, polypeptide, carbohydrate, and nucleic acid (DNA, RNA)arrays. The most important thing in the research is to fabricate aninexpensive array having high density on the substrate, effectively.

At the present time, as the method for fabricating the biomolecule ormacromolecule array, there are a spotting method for dropping abiochemical material to a desired location by moving a micro-robot inthree dimensions, a photolithography method for selectively illuminatinglight to the desired location to vary the surface thereof so that thecoupling reaction between the surface and the biomolecule is generatedin only a specific location, and an electric addressing method foradjusting the electrode voltage of a microelectrode array to attach thebiomolecule to only a specific electrode.

The spotting method includes a contact printing method for adhering asolution on a paper like as a seal is affixed and a non-contact printingmethod for dropping the solution. The contact printing method isprogressed in order of a loading step, a printing step, and a washingstep, by using a XYZ robot. Since this method uses a pin the end ofwhich is formed with a groove like the point of a fountain pen, thevolume of the sample can be reproducibly adjusted and a plurality ofprinting steps can be performed when the sample is loaded one time.However, this method has a demerit which the number of the arrays perthe unit area can be not increased. As the non-contact printing method,there are a dispensing method and an ink-jet printing method. Thedispensing method is the method for dropping the solution like as amicropipette is used, and the ink-jet printing method is the methodwhich a fine pressure is applied to a reservoir such that the solutionblows off. If the ink-jet printing method is used, the volume of thesample solution can be finely adjusted to nano-liter such that thenumber of the arrays per the unit area can be remarkably increased. Inthis method, every sample solution needs the reservoir, but the numberof the reservoirs which can be provided to the robot is limited.Accordingly, this method can be used in only case where the array isfabricated by using only a few sample solutions.

Affymetrix corporation firstly use the photolithography method in asemiconductor manufacturing process (U.S. Pat. No. 5,959,098). When theultraviolet light is selectively illuminated to, the moleculeimmobilized to the surface of the substrate and having, protectinggroups by using a photomask, the protecting group falls out and OH groupappears. When the solution including biomolecule or macromoleculemonomer to be attached is dropped, the biomolecule or macromoleculemonomer is fixed to only the portion in which the OH group appears.Since another protection group is present in this attached macromoleculemonomer, another monomer can be attached when the light is selectivelyilluminated. Therefore, the biomolecule or macromolecule array having adesired array can be fabricated by repeatedly performing theseoperations. This method can fabricate the array having high density andsynthesize in parallel. However, since a plurality of photomask arerequired, this method brings out a problem that it takes much time andcost. Accordingly, the method for fabricating the array by operating themicromirror of a micromirror array without using the photomask wasdeveloped (U.S. Pat. No. 6,271,957). This method brings out problemsthat the complex optical system is required and only a mosaic patterncan be obtained.

The electronic addressing method is the method for attaching thebiomolecule by using the voltage controlling function of themicroelectrode array, and includes a method for moving the biomoleculehaving a charge into electrode surface to generate physical or chemicalcoupling and a method for attaching the biomolecule within thin filmwhen the thin film is formed by an electrochemical deposition (Cosnier,Serge, “Biomolecule immobilization on electrode surfaces by entrapmentor attachment to electochemically polymerized films. A review”Biosensors & Bioelectronics 14: pp. 443-456 (1999)). For example, sincethe DNA has many a negative charge, DNA moves toward the electrode ifthe electrode has positive charges. At this time, if the physical orchemical coupling between the DNA and the electrode is generated, theDNA is attached to the electrode (U.S. Pat. No. 5,605,662). Suchelectrode addressing method brings out problems that it can be notapplied to the case where a number of arrays are used and amicroelectrode array is required. In addition, a method forelectrochemically changing pH around the electrode to attach thebiomolecule to the selected location was developed, and Combimatrixcorporation discloses a method for combining an oligonucleotide to theselected location of the microelectrode by using this concept (U.S. Pat.No. 6,090,302). However, in this method, there is a problem that theyield of each reaction is low, thereby the degree of purity of each cellis low.

As the method for fabricating the biomolecule or macromolecule, a methodusing a LCD (liquid crystal display) type programmable mask which thetransmission of the light can be adjusted without using the micromirrorarray was disclosed (U.S. Pat. No. 6,271,957, Korean Patent PublicationNo. 2001-2915). In the LCD type programmable mask, the operation foradjusting the transmission of the light in each pixel to generateoptical reaction in the cell on the substrate is repeatedly performed,thereby the biomolecule or macromolecule array is fabricated. However,the LCD type programmable mask has problems in a point of view ofpolarization, UV transmission, and deactivation due to ultravioletlight. Accordingly, the programmable mask satisfies the next facts.

First, since the light output from the general LCD is polarized and theprotection group on the substrate generally exists therein withoutorientation, every protection group exist in a specific cell on thesubstrate can not be stripped by the light output from the LCD.Accordingly, in order to increase the reaction yield in fabricating thearray, the device for changing the light output from the LCD to thenon-polarized light is needed.

Second, in the general LCD, the light in range of the visible ray istransmitted, but, in order to strip the protection group, theultraviolet light having wavelength of 330-400 nm is required. In caseof an orientation film and a polarizer provided in the general LCD,since it is readily deactivated the deactivation due to the ultravioletlight, the orientation film and the polarizer which are not affected bythe ultraviolet light must be used. Also, the orientation film and thepolarizer whose the absorption of the ultraviolet light is low must beused.

Third, in case of the TFT-LCD type programmable mask, a light shieldfield (a black matrix) can prevent the transistor from be affected bythe ultraviolet light, but an amorphous silicon transistor of thedriving circuit can be affected by scattered ultraviolet light. This isthe demerit of the conventional programmable mask. Also, since theamorphous silicon transistor has dark-conductivity higher thanphoto-conductivity by 10⁶ times, it can not function as a switchingelement, thereby the arranged state of the liquid crystal can not beadjusted.

Fourth, in order to strip the protection group in synthesis of the DNA,the suitable illumination dose of the light is required. In necessary,the synthesis must be performed, changing the wavelength of a small doseof the light. Since the illumination dose of the light depends on theintensity of the light source, the illuminated time of the light, thetransmissivity of the LCD type programmable mask, the illumination doseof the light must be adjusted by electrically adjusting the transmissionof the programmable mask.

Fifth, if the ultraviolet light is illuminated to the biomolecule, thereaction or the deactivation therein may be generated. In order toprevent this, only the ultraviolet light having a narrow wavelengthrange which can strip the protection group without affecting thebiomolecule must be illuminated to the cell.

Sixth, in order to maximize the number of the cells per the unit area tofabricate the biomolecule array having high density, the number of thepixels in the LCD must be minimized. In order to reduce the size of thepixel, the LCD with a built-in driving circuit must be manufactured.

As mentioned above, in order to fabricate the biomolecule or themacromolecule array, the LCD type programmable mask which can solve theabove-mentioned problems is required.

SUMMARY OF THE INVENTION

Thus, the object of the present invention is to provide a LCD typeprogrammable mask in which the protection group within a specific cellon a sample substrate can be readily stripped and the illumination doseof the light can be adequately adjusted so that the biomolecule arrayhaving high density can be fabricated.

The another object of the present invention is to provide a method forfabricating the biomolecule array having high density by using saidprogrammable mask.

A programmable mask according to one embodiment of the present inventioncomprises a lower substrate of which an upper surface has a polysiliconthin film transistor for switching a pixel area in accordance with anelectrical signal applied thereto, a lower pixel electrode composed of atransparent electrode and connected to the drain electrode of said thinfilm transistor, and an orientation film formed on said lower pixelelectrode and said thin film transistor, and of which an lower surfacehas a polarizer formed thereon; an upper substrate of which an lowersurface has an upper pixel electrode composed of a transparent electrodeand an orientation film formed under said upper pixel electrode, and ofwhich an upper surface has a polarizer formed thereon; liquid crystalinjected between said lower substrate and said upper substrate andvaried in accordance with a voltage applied thereto to selectivelytransmit light; and a driving circuit formed on the upper surface ofsaid lower substrate, for driving the polysilicon thin film transistorin said pixel area.

A programmable mask according to another embodiment of the presentinvention comprises a lower substrate of which an upper surface has apolysilicon thin film transistor for switching a pixel area inaccordance with an electrical signal, a lower pixel electrode composedof a transparent electrode and connected to the drain electrode of said,thin film transistor, and an orientation film formed on said lower pixelelectrode and said thin film transistor; an upper substrate of which anlower surface has an upper pixel electrode composed of a transparentelectrode and an orientation film formed under said upper pixelelectrode, and of which an upper surface has a polarizer formed thereon;Guest-Host liquid crystal injected between said lower substrate and saidupper substrate, for shielding or transmitting light by allowing theoscillation direction of linearly-polarized light to be equal ororthogonal to the light absorbing axis of a dye in accordance with avoltage applied thereto; and a driving circuit formed on the uppersurface of said lower substrate, for driving the polysilicon thin filmtransistor in said pixel area.

A programmable mask according to further another embodiment of thepresent invention comprises a lower substrate of which an upper surfacehas a polysilicon thin film transistor for switching a pixel area inaccordance with an electrical signal applied thereto, a lower pixelelectrode composed of a transparent electrode and connected to the drainelectrode of said thin film transistor, a first dielectric mirror formedon said lower pixel electrode for generating constructive interferenceof incident light, and an orientation film formed on said firstdielectric mirror; an upper substrate of which lower surface has anupper pixel electrode composed of a transparent electrode, a seconddielectric mirror formed on said upper pixel electrode for generatingconstructive interference of incident light, and an orientation filmformed on said second dielectric mirror; and liquid crystal injectedbetween said lower substrate and said upper substrate and varied inaccordance with a voltage applied thereto to selectively transmittinglight, wherein said first dielectric mirror and said second dielectricmirror forms a Febry-Parot type optical filter, and only theconstructive-interfered light having a specific wavelength isselectively transmitted by said Febry-Parot type optical filter.

A method for fabricating a biomolecule array using the programmable maskaccording to the present invention comprises the steps of preparing saidprogrammable mask; providing a sample substrate under said programmablemask; supplying a electrical signal to said programmable mask toadjusting the transmission of light in a selected pixel area byarrangement of the liquid crystal; illuminating the light selectivelypassing through said pixel area to said sample substrate; and generatingoptical reaction in a biomolecule contained in said sample substrate bythe light illuminated thereto to form a biomolecule array according tothe pattern of said programmable mask.

In the method for fabricating the biomolecule array, the lightselectively passing through said pixel area may be changed tonon-polarized light by a depolarizer so that the non-polarized light isilluminated to said sample substrate, and the optical reaction may begenerated by the non-polarized light to form the biomolecule array.

In the method for fabricating the biomolecule array, said liquid crystalincludes nematic liquid crystal and dye added thereto, and is Guest-Hostliquid crystal which can shield or transmit light by allowing theoscillation direction of linearly-polarized light to be equal ororthogonal to the light absorbing axis of the dye in accordance with avoltage applied thereto, the arranged state of said Guest-Host liquidcrystal may be adjusted by the electrical signal applied to saidprogrammable mask to selectively irradiate the light to said samplesubstrate such that the biomolecule array is formed.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 a is a plan view of a TFT-LCD (Thin Film Transistor-LiquidCrystal Display) type programmable mask according to the presentinvention, and FIG. 1 b is an elevational view thereof.

FIG. 2 is a schematic view for illustrating a photolithography operationusing the TFT-LCD type programmable mask according to the presentinvention.

FIG. 3 is a circuit diagram of an active matrix programmable mask with abuilt-in driving circuit.

FIG. 4 is a section view of the active matrix programmable mask with thebuilt-in driving circuit according to one embodiment of the presentinvention.

FIG. 5 is a section view of the active matrix programmable mask with thebuilt-in driving circuit, having a depolarizer.

FIG. 6 is a section view for illustrating the active matrix programmablemask with the built-in driving circuit according to another embodimentof the present invention.

FIG. 7 is a section view for illustrating the active matrix programmablemask with a built-in driving circuit according to further anotherembodiment of the present invention.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

Hereinafter, the preferred embodiments of the present invention will beexplained with reference to the accompanying drawings. However, theseembodiments are provided so that those skilled in the art can understandthe present invention and it may be variously changed, and the presentinvention should not be understood as limited to the specificembodiments thereof. In figure, the same reference numeral indicates thesame element.

Next, the structure of a LCD type programmable mask for switching theultraviolet light and a method for manufacturing the same will bedescribed. The structure of the LCD type programmable mask isschematically described with reference to the accompanying drawings, anda circuit diagram of the programmable mask, a sectional view of theprogrammable mask, the operation of the optical valve liquid crystal,and light intensity adjustment and wavelength filter function andnon-polarization of the light passing through the programmable mask aredescribed. In order to make understand the programmable mask, a methodfor manufacturing the panel of the polysilicon thin film transistor ofthe TFT-LCD type programmable mask, a method for forming a pixel, amethod for injecting liquid crystal, and a method for attaching theupper and lower panels each other are described.

FIG. 1 a is a plan view for illustrating the TFT-LCD type programmablemask according to the present invention, and FIG. 1 b is an elevationalview thereof.

Referring FIGS. 1 a and 1 b, the schematic structure of the TFT-LCD typeprogrammable mask as follows. A quartz substrate 100 which has excellenttransmissivity of the ultraviolet light has a rectangular shape like ageneral photomask, and a portion thereof is formed with a TFT-LCD typeoptical valve area, i.e., an ultraviolet-light-illuminated area 140composed of an active matrix polysilicon thin film transistor array andliquid crystal. Also, the quartz substrate includes an area located attwo sides of the area 140 for applying electrical signals to the gatelines of the transistors and data lines arranged in a matrix,respectively, a area for selecting the pixel to be switched (applying agate signal and a source signal to the transistor of the pixel to beselected), an driving circuit (an integrated circuit) area 150 formed onthe same plane simultaneously in the process the active matrixtransistor is manufactured, and an electrode pad 152 for connecting thedriving circuit with an external integrated circuit. A flexible printedcircuit is bonded to the electrode pad 152. In addition, the outside ofthe quartz substrate 100 of the programmable mask including thepolysilicon thin film transistor is formed with aligning keys 158 atfour points. The quartz substrate 100 having the above-mentionedstructure is referred as a lower substrate 100 a. As mentioned above,when the lower substrate 100 a composed of the driving circuit includingthe polysilicon thin film transistor and the electrode pad 152 isformed, an upper substrate 100 b which is the opposite substrate thereoffor injecting the liquid crystal and is formed with pixels correspondingto the pixels on the lower substrate 100 a respectively is manufactured.The lower substrate 100 a has a thickness of 2-5 mm so as to endure thebending due to external force as the main body of the mask, and theupper substrate 100 b has a thickness of 0.1-0.6 mm such that theabsorption of the ultraviolet light can be minimized. In order tomaintain a certain interval therebetween, an adhesive portion 154 isformed between the lower substrate 100 a and the upper substrate 100 b,the liquid crystal is injected between the lower substrate 100 a and theupper substrate 100 b through a liquid injecting hole 156, and then thesubstrates are sealed. Like this, the lower substrate 100 a and theupper substrate 100 b are attached each other, and the liquid crystal isinjected therebetween, and then the substrates are sealed, thereby theprogrammable mask 100′ according to the present invention can bemanufactured.

FIG. 2 is a schematic view for illustrating a photolithography operationperformed by illuminating the ultraviolet light to the programmable maskand the sample substrate. FIG. 2 illustrates the photolithographyoperation performed in case where is applied to a device such as acontact type mask aligner.

Referring to FIG. 2, generally, the mask having a patterned chromium onthe quartz substrate is used as the mask, but the present invention usesthe programmable mask 100′ in which the lower substrate 100 a and theupper substrate 100 b are attached each other shown in FIGS. 1 a and 1b. This mask 100′ is laid on a support base 170, and the samplesubstrate 176 to be formed with the biomolecule or macromolecule ispositioned below the programmable mask 100′, and the programmable mask100′ and the sample substrate 176 are fixed such that the aligning keysthereof are matched each other, and then data programmed in a personalcomputer 174 are supplied through a connecting portion 172 to operate adesired transistor on the matrix such that the liquid crystal isswitched. The pattern 178 shown in FIG. 2 is the pattern of thebiomolecule or macromolecule synthesized by repeatedly illuminating theultraviolet light 111.

FIG. 3 is a circuit diagram of the programmable mask with a built-indriving circuit, having a polysilicon drive integrated circuit therein,according to the preferred embodiment of the present invention.

Referring to FIG. 3, the programmable mask according to the presentinvention is characterized in that it is integrated with the drivingcircuit, because it has a purpose for synthesizing the DNA of the highdensity, and the polysilicon thin film transistor is arranged in thepixel portion. In FIG. 3, the array of the high density can be formed byproviding the built-in driving circuit composed of the polysilicon thinfilm transistor at the periphery of the pixel area. Such active matrixprogrammable mask with the built-in driving circuit has the merit thatthe ultraviolet light can be precisely adjusted and the high density canbe accomplished. The programmable mask according to the presentinvention has the polysilicon thin film transistor formed in the pixelarea and the built-in driving circuit formed simultaneously in theprocess for manufacturing the pixel at the periphery of the pixel area.In order to directly connect the circuit to the gate line 106 and thedata line 110, the pixel area and the driving circuit whose the activelayer of the transistor is formed of the polysilicon are formed in thesame plane. In order to stably driving the liquid crystal, a storageelectrode having a wide area for maximizing the capacitance of theabove-mentioned electrode of a commercial TFT-LCD is formed in the pixelarea.

FIG. 4 is a section view of the active matrix programmable mask with thebuilt-in driving circuit according to the one embodiment of the presentinvention.

Referring to FIG. 4, the fabricating method thereof will be explained. Apolysilicon thin film 102 is formed on a quartz substrate 100 having athickness of 2-5 mm by an excimer laser annealing method or a furnaceannealing method, and then a gate insulating film 104 is formed by aPECVD (Plasma Enhanced Chemical Vapor Deposition) or a high-temperatureoxidation method. Thereafter, a gate electrode 106 composed of a dopedpolysilicon or metal is formed thereon. After an interlayer insulatingfilm 108 is deposited and a source electrode 110 and a drain electrode112 are formed, a lower pixel electrode 117 composed of the transparentelectrode such as ITO (Indium Tin Oxide) and connected with the drainelectrode 112 is formed. And, an orientation film 116 for allowing theliquid crystal to be oriented is formed. The above-mentioned process isthe method for manufacturing the lower substrate 100 a. The method formanufacturing the upper substrate 100 b is progressed as follows. Ashielding film 118 for shielding the ultraviolet light illuminated tothe thin film transistor is formed on a quartz substrate 100 having athickness of 100-600 μm and a protecting film (not shown) is formed, andthen an orientation film 116 and an upper pixel electrode 119 composedof a transparent electrode and applied with a common voltage are formedunder the protection film. The upper substrate 100 b and the lowersubstrate 100 a manufactured as mentioned above are attached each otherin the order of the general TFT-LCD process. After the attachmentprocess thereof is finished, a polarizer 120 a and a polarizer 120 borthogonal to the polarizer 120 a are attached to the substrates 100 aand 100 b. FIGS. 4(a) and 4(c) show the state that the polarized light111 a is output through the liquid crystal 122 when a ground voltage (0V) is applied to the upper and lower end of the liquid crystal 122. Atthis time, the ultraviolet light 111 rotated by 90 degree passes throughthe liquid crystal 122. FIG. 4(b) shows the state that thelinearly-polarized ultraviolet light output through the upper polarizer120 a is shielded in the lower polarizer 102 b when a source voltage isapplied to the transparent electrode 117 according to an operation ofthe polysilicon thin film transistor. At this time, thelinearly-polarized ultraviolet light is not rotated in the liquidcrystal, so that the direction of the linearly-polarized light ismaintained. By combining one polysilicon thin film transistor and oneliquid pixel shown in FIG. 4, the dense programmable mask having a sizeof 10-20 μm can be fabricated.

The polarizers 120 a and 120 b can be implemented by using amacromolecule film having a transmissivity and a tolerance with respectto the ultraviolet light, i.e., an organic polymer substance, and aninorganic crystal having birefringence characteristics. As therepresentative organic polymer, there is polyvinyl alcohol (PVA), and,as the inorganic crystal, there are calcite, quartz, tourmaline, sodiumnitrate, rutile, and TiO₂. Concretely, a linear polarizer using theorganic polymer dealt in Newport corporation (Model No. 20LP-UV) and aGlan-Thomson calcite polarizer composed of the inorganic crystal (ModelNO. 10GT04).

As the orientation film 116, a substance of which a transmissivity forultraviolet light having the wavelength of 330-400 nm is high anddeactivation is not generated is used. For example, as the orientation116, an ultraviolet-resistant polyimid film, a silicon oxide film formedby a slope sputtering method or a slope thermal deposition method, or aDLC (Diamond-like-carbon) film for allowing the liquid crystal to beoriented by illuminating an ion beam can be used.

FIG. 5 shows a case where a depolarizer for removing the polarizedproperty 124 is attached under the polarizer 120 b.

Referring to FIG. 5, the light 111 a passing through the depolarizer 124is similar to the incident light 111, except for the intensity of light.By further comprising the depolarizer 124, the non-polarized light isilluminated to the sample substrate (see ‘176’ in FIG. 2) to generatethe optical reaction, thereby the biomolecule or macromolecule array canbe fabricated.

FIG. 6 is a section view for illustrating the active matrix programmablemask with the built-in driving circuit according to another embodimentof the present invention.

Referring to FIG. 6, the programmable mask shown in FIG. 6 switches thelight in the method different from that of the programmable mask shownin FIG. 4. That is, in FIG. 4, the two polarizers 120 a and 120 b can beused, but, in FIG. 6, one polarizer 120 a is used and Guest-Host typeliquid crystals 130 a, 130 b are used as the liquid crystal. While thegeneral liquid crystal (see ‘122’ in FIG. 4) allows the incidentpolarized light to pass therethrough, rotating the direction thereof ornot, the Guest-Host type liquid crystals 130 a, 130 b itself shields thelight. The ultraviolet light 111 is strongly absorbed to dichroic dye130 b. If the voltage is not applied to the Guest-Host type liquidcrystals 130 a, 130 b (FIG. 6(b)), because the oscillating direction ofthe linearly-polarized light from the polarizer 120 a is equal to thelight absorbing axis of the dye 130 b, the light is absorbed so that thetransmitted light is dyed, thereby the ultraviolet light 111 is stronglyabsorbed to the dye 130 b so as to do not transmit the programmablemask. Otherwise, if the voltage is applied to the Guest-Host type liquidcrystals 130 a, 130 b (FIGS. 6(a) and 6(c)), because the oscillatingdirection of the linearly-polarized light from the polarizer 120 a isorthogonal to the light absorbing axis, the light is not absorbed inprinciple so that the transmitted light is not dyed, thereby theultraviolet light 111 is hardly absorbed to transmit the programmablemask. Regardless of the number of the wavelengths of the incidentultraviolet light 111, the wavelength of the ultraviolet light 11 apassing through the mask is equal to that of the incident ultravioletlight 111. That is, no variation is generated, except for the intensityof the light.

If only the light having a specific wavelength must be used when thebiomolecule or macromolecule array is fabricated, the incidentultraviolet generating device according to the embodiment of the presentinvention must be provided with a fine adjustable optical filter underthe ultraviolet light source and an ultraviolet laser source must beused. If the optical filter is used, it is troublesome when theultraviolet light having a plurality of wavelengths is needed. If theultraviolet laser source is used, the device for fabricating the arrayis limited, because almost ultraviolet laser source has a pulse shape.Accordingly, in the present invention, a Fabry-Parot typewavelength-variable liquid crystal filter for transmitting only thelight having the needed wavelength among the light having a plurality ofthe wavelengths is arranged on the mask in matrix. The basic principleof the Fabry-Parot type filter using the liquid crystal is to transmitonly the constructive-interfered light by the variation of n or d in thecondition that the light repeatedly reflected between the dielectricmirrors is constructive-interfered, that is, an equation ndcos θ=m λ/2(n=refractive index, d=thickness of the liquid crsytal). Since thethickness of the liquid crystal is fixed, the liquid crystal filter cantransmit only the light having a desired wavelength by the variation ofthe reflective index n. The variation of n can be actually adjusted bythe variation of the voltage across the both ends of the liquid crystal.This type of the filter is constructed by arranging a wavelengthdivision multiplexing liquid crystal filter on the programmable mask soas to be driven by the polysilicon transistor, in the opticalcommunication system.

FIG. 7 is a section view for illustrating the active matrix programmablemask with the built-in driving circuit according to further anotherembodiment of the present invention.

Referring to FIG. 7, the programmable mask includes a Fabry-Parotwavelength-variable liquid crystal filter, and is different from thestructure in FIGS. 4 to 6 in that the dielectric mirrors 126 are locatedon the both ends of the liquid crystal. The other words, the dielectricmirror 126 for generating the constructive interference of the incidentultraviolet light are provided on the lower pixel electrode 117 composedof the transparent electrode and connected with the drain electrode 112of the polysilicon thin film transistor in the lower substrate 100 a,and the orientation film 116 is provided on the dielectric mirror 126.Also, the dielectric mirror 126 for generating the constructiveinterference of the incident ultraviolet light is provided under theupper pixel electrode 119 composed of the transparent electrode andapplied with the common voltage in the upper substrate 100 b, and theorientation film 116 is provided under the dielectric film 126. Thethickness of the liquid crystal and the reflectivity of the dielectricmirror 126 selected thereat is determined by calculation. Since thelight having the wavelength selected thereat is in thelinearly-polarized state, it can be changed to the non-polarized lightby the above-mentioned depolarizer (see ‘124’ in FIG. 5).

As mentioned above, according to the present invention, the programmablemask includes a LCD panel in which the color filter layer is removed andthe depolarizer and the transmission of the non-polarized ultravioletlight is adjusted, thereby the biomolecule or macromolecule array suchas DNA can be effectively fabricated.

According to the present invention, the volume of the device can bereduced in comparison with the existing optical mask or micromirrorarray and the inexpensive array of high density can be readilyfabricated. Also, mass production of the biomolecule or macromoleculearray can be readily performed in case where a stepping function existsor many an array pattern exist in a programmable mask.

Since the liquid crystal, the orientation film, the substrate, and thepolarizer which allows the ultraviolet light to pass therethrough and isnot deactivated by the ultraviolet light are used, the programmable maskcan be used for a long time. In addition, if which the polysilicon thinfilm transistor is used instead of the amorphous silicon, it can be usedfor a longer time, because the stability for dispersion of the lightbecomes high.

In case where the LCD with a built-in driving circuit is used, the densebiomolecule or macromolecule array in which the size of the cell issmall can be fabricated. Because the photolithography condition can bereadily adjusted by adjusting the intensity or the wavelength of thelight passing through the programmable mask, the biomolecule ormacromolecule array of high yield can be fabricated.

Also, in case where such programmable mask is fabricated in a smallsize, it is can be utilized as a DNA chip manufacturing device which canbe used in a hospital or a laboratory. Accordingly, the DNA chip of highdensity can be inexpensively fabricated.

1. A biomolecule array fabricating apparatus, comprising: programmablemask; ultraviolet light; support base supports the programmable maskabove sample substrate to be formed with biomolecule; and computeroutputs programmed data to operate a desired transistor in theprogrammable mask; wherein the programmable mask, including: a lowersubstrate of which an upper surface has a polysilicon thin filmtransistor for switching a pixel area in accordance with an electricalsignal applied thereto, a lower pixel electrode connected to the drainelectrode of said thin film transistor, and an orientation film formedon said lower pixel electrode and said thin film transistor, and ofwhich an lower surface has a polarizer formed thereon; an uppersubstrate of which an lower surface has an upper pixel electrode and anorientation film formed under said upper pixel electrode, and of whichan upper surface has a polarizer formed thereon; liquid crystalsinjected between said lower substrate and said upper substrate andvaried in accordance with a voltage applied thereto to selectivelytransmit the ultraviolet light; and a driving circuit formed on theupper surface of said lower substrate, for driving the polysilicon thinfilm transistor in said pixel area.
 2. The biomolecule array fabricatingapparatus according to claim 1, wherein said polarizer has a hightransmissivity with respect to ultraviolet light having wavelength of330-400 nm and is composed of a polymer film which is not deactivated bysaid ultraviolet light.
 3. The biomolecule array fabricating apparatusaccording to claim 2, wherein said polymer film is composed of polyvinylalcohol, and said inorganic crystal is composed of calcite, quartz, ortourmaline.
 4. The biomolecule array fabricating apparatus according toclaim 1, wherein further comprises a shielding film formed on said uppersubstrate or said lower substrate for shielding the ultraviolet lightincident from aid thin film transistor.
 5. The biomolecule arrayfabricating apparatus according to claim 1, wherein further comprises adepolarizer for changing the ultraviolet light incident to the lowerportion of said lower substrate to non-polarized light.
 6. Thebiomolecule array fabricating apparatus according to claim 1, whereinsaid polarizer has a high transmissivity with respect to ultravioletlight having wavelength of 330-440 nm and is composed of a substancewhich is not deactivated by said ultraviolet light.
 7. The biomoleculearray fabricating apparatus according to claim 6, wherein said, whereinsaid substance which is not deactivated by said ultraviolet light is apolyimid film resistant to the ultraviolet light, a silicon oxide filmformed by a slope sputtering method or a slope thermal depositionmethod, or a diamond-like-carbon (DLC) film for allowing the liquidcrystal to be oriented by illuminating an ion beam.
 8. A biomoleculearray fabricating apparatus, comprising: programmable mask; ultravioletlight; supprort base supports the programmable mask above samplesubstrate to be formed with biomolecule; and computer outputs programmeddata to operate a desired transistor in the programmable mask; whereinthe programmable mask, including: a lower substrate of which an uppersurface has a polysilicon thin film transistor for switching a pixelarea in accordance with an electrical signal, a lower pixel electrodeconnected to the drain electrode of said thin film transistor, and anorientation film formed on said lower pixel electrode and said thin filmtransistor; an upper substrate of which an lower surface has an upperpixel electrode and an orientation film formed under said upper pixelelectrode, and of which an upper surface has a polarizer formed thereon;Guest-Host liquid crystal injected between said lower substrate and saidupper substrate, for shielding or transmitting light by allowing theoscillation direction of linearly-polarized light to be equal ororthogonal to the light absorbing axis of a dye in accordance with avoltage applied thereto; and a driving circuit formed on the uppersurface of said lower substrate, for driving the polysilicon thin filmtransistor in said pixel area.
 9. The biomolecule array fabricatingapparatus according to claim 8, wherein said polarizer has a hightransmissivity with respect to ultraviolet light having wavelength of330-440 nm and is composed of a polymer film which is not deactivated bysaid ultraviolet light.
 10. The biomolecule array fabricating apparatusaccording to claim 9, wherein said polymer film is composed of polyvinylalcohol, and said inorganic material is composed fo calcite, quartz, oftourmaline.
 11. The biomolecule array fabricating apparatus according toclaim 8, wherein further comprises a shielding film formed on said uppersubstrate or said lower substrate for shielding the ultraviolet lightincident from said thin film transistor.
 12. The biomolecule arrayfabricating apparatus according to claim 8, wherein further comprises adepolarizer for changing the ultraviolet light incident to the lowerportion of said lower substrate to non-polarized light.
 13. Thebiomolecule array fabricating apparatus according to claim 8, whereinsaid polarizer has a high transmissivity with respect to ultravioletlight having wavelength of 330-440 nm and is composed of a substancewhich is not deactivated by said ultraviolet light.
 14. The biomoleculearray fabricating apparatus according to claim 13, wherein saidsubstance which is not deactivated by said ultraviolet light is apolyimid film resistant to the ultraviolet light, a silicon oxide filmformed by a slope sputtering method or a slope thermal depositionmethod, or a diamond-like-carbon (DLC) film for allowing the liquidcrystal to be oriented by illuminating an ion beam.